USPatentGranted
I4

Structure of an improved bipolar transistor

Granted 3 Dec 1985 · no office action yet

Assignee:

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Inventors: Cheng T. Horng, Hans S. Rupprecht, Robert O. Schwenker, Joseph R. Cavaliere +1 · Examiner: · AU 253 · TC 2500

Application
695657
filed 28 Jan 1985
Publication
Not published
not published
Patent· this page
US T106101
granted 3 Dec 1985

Life of the patent

2 dated events
⤢ drag to zoomJan 1985Apr 1985Jul 1985Oct 1985Jan 1986Prosecution
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Abstract

An improved bipolar transistor structure formed in a very small area of a thin epitaxial layer on a planar surface of a silicon substrate of first conductivity type, said very small area of the thin epitaxial layer having vertical sidewalls extending to the planar surface of said substrate, said area of thin epitaxial layer containing in the order recited a shallow depth emitter region of a second conductivity type having an exposed planar surface, a shallow depth base region of said first conductivity type, and a shallow depth active collector region of said second conductivity type, an elongated region of said first conductivity type surrounding said emitter, base and active collector regions, said elongated region being contained within and coextensive with said vertical sidewalls of said small area of said thin epitaxial layer, whereby the base collector capacitance is materially reduced due to the very small area of the base-collector junction.

Classifications

8 codes
IPC · International Patent Classification
Section H — Electricity
  • H01L21/762
  • H01L21/331
  • H01L21/285
  • H01L29/732
USPC · US Patent Classification
357/34357/59357/50357/49

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