Sputter target for a physical vapor deposition chamber
Granted 30 Nov 2021 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Attorney: Attorney · Log in to unlock
Inventors: Srinivasa Rao Yedla, Martin Riker, William Fruchterman, Kirankumar Neelasandra Savandaiah +1 · Examiner: Calvin E Vansant · AU 2915 · TC 2900
Life of the patent
2 dated eventsDescription
1 parts›FIG. 1 is a top isometric view of…
FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to one embodiment of the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a right elevation view thereof.
FIG. 5 is a left elevation view thereof.
FIG. 6 is a front elevation view thereof.
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is an enlarged cross-sectional view taken along line 8 - 8 in FIG. 2 .
The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.
Claims
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6 members · 3 offices›IP5 & PCT — 4 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D937329-S | S1 | 30 Nov 2021 | 23 Mar 2020 | granted | Sputter target for a physical vapor deposition chamber |
| US | US-D970566-S | S1 | 22 Nov 2022 | 26 Oct 2021 | granted | Sputter target for a physical vapor deposition chamber |
| JP | JP-1685527-S | S | 17 May 2021 | 14 Sep 2020 | granted | no title held |
| JP | JP-1702035-S | S | 13 Dec 2021 | 14 Sep 2020 | granted | no title held |
›Other offices — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D215707-S | S | 1 Dec 2021 | 23 Sep 2020 | published | 物理氣相沉積腔室的濺射靶材zh |
| TW | TW-D227747-S | S | 1 Oct 2023 | 23 Sep 2020 | published | 物理氣相沉積腔室的濺射靶材zh |
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