Electrode plate for a plasma processing apparatus

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/635,289, filed herewith and entitled “Gas Ring for a Plasma Processing Apparatus”;

Application Ser. No. 29/635,292, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”; and

Application Ser. No. 29/635,296, filed herewith and entitled “Electrode Plate Peripheral Ring for a Plasma Processing Apparatus”.

FIG. 1 is a front, bottom and right side perspective view of an electrode plate for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8 - 8 of FIG. 2 ;

FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8 ; and,

FIG. 10 is an enlarged view of the portion shown in box 10 in FIG. 2 .

The broken lines show the boundaries of the enlarged portions illustrated in FIG. 9 and FIG. 10 and form no part of the claimed design.