Target profile for a physical vapor deposition chamber target
Granted 29 Apr 2025 · no office action yet
Current assignee: Applied Materials Israel · originally Applied Materials, Inc.
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Attorney: Attorney · Log in to unlock
Inventors: Wei Dou, Avinash Nayak, Sundarapandian Ramalinga Vijayalakshmi Reddy, Kirankumar Neelasandra Savandaiah +4 · Examiner: Mark A Goodwin · AU 2914 · TC 2900
Life of the patent
2 dated eventsDescription
1 parts›FIG. 1 is a top perspective view of…
FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target;
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a right elevation view thereof.
FIG. 7 is a left elevation view thereof.
FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.
FIG. 9 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a right elevation view thereof.
FIG. 15 is a left elevation view thereof; and,
FIG. 16 is an enlarged partial front elevation view showing portions of the design in greater detail.
The broken lines shown in the drawings depict portions of the target profile for a physical vapor deposition chamber target that form no part of the claimed design. The dot-dash lines encircling portions of the target profile for a physical vapor deposition chamber target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.
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5 members · 3 offices›IP5 & PCT — 3 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| USthis patent | US-D1072774-S | S1 | 29 Apr 2025 | 6 Feb 2021 | granted | Target profile for a physical vapor deposition chamber target |
| JP | JP-1740421-S | S | 30 Mar 2023 | 29 Jul 2021 | granted | 物理蒸着チャンバー用ターゲットja |
| JP | JP-1740484-S | S | 30 Mar 2023 | 29 Jul 2021 | granted | 物理蒸着チャンバー用ターゲットja |
›Other offices — 2 members
| Office | Publication | Kind | Published | Filed | Status | Title |
|---|---|---|---|---|---|---|
| TW | TW-D232373-S | S | 21 Jul 2024 | 29 Jul 2021 | published | 用於物理氣相沉積腔室的靶材zh |
| TW | TW-D236584-S | S | 1 Mar 2025 | 29 Jul 2021 | published | Target for a physical vapor deposition chamber |
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