USPatentGranted
S1

Target profile for a physical vapor deposition chamber target

Granted 29 Apr 2025 · no office action yet

Application
29/769,610
filed 6 Feb 2021
Publication
Not published
not published
Patent· this page
US D1072774
granted 29 Apr 2025

Life of the patent

2 dated events
⤢ drag to zoomJan 2021Jul 2021Jan 2022Jul 2022Jan 2023Jul 2023Jan 2024Jul 2024Jan 2025Jul 2025Prosecution
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Description

1 parts
›FIG. 1 is a top perspective view of…

FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target;

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a right elevation view thereof.

FIG. 7 is a left elevation view thereof.

FIG. 8 is an enlarged partial front elevation view showing portions of the design in greater detail.

FIG. 9 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a front elevation view thereof.

FIG. 13 is a back elevation view thereof.

FIG. 14 is a right elevation view thereof.

FIG. 15 is a left elevation view thereof; and,

FIG. 16 is an enlarged partial front elevation view showing portions of the design in greater detail.

The broken lines shown in the drawings depict portions of the target profile for a physical vapor deposition chamber target that form no part of the claimed design. The dot-dash lines encircling portions of the target profile for a physical vapor deposition chamber target in FIGS. 4 and 8 indicate enlargements and form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

1 codes
USPC · US Patent Classification
D13/182

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File wrapper

Pendency
4.2 y
1,543 days filing → grant
Office actions
0
on the grant's record
Examiner
Mark A Goodwin
art unit 2914 · TC 2900
Citations: 147 back · 1 forward

Chain of title

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Worldwide family

5 members · 3 offices
US1JP2TW2
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
5
DOCDB simple family 85717867
Offices
3
US · JP
Granted
3 of 5
grant date present
Non-English titles
3
shown as filed, never translated
›IP5 & PCT — 3 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D1072774-SS129 Apr 20256 Feb 2021grantedTarget profile for a physical vapor deposition chamber target
JPJP-1740421-SS30 Mar 202329 Jul 2021granted物理蒸着チャンバー用ターゲットja
JPJP-1740484-SS30 Mar 202329 Jul 2021granted物理蒸着チャンバー用ターゲットja
›Other offices — 2 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D232373-SS21 Jul 202429 Jul 2021published用於物理氣相沉積腔室的靶材zh
TWTW-D236584-SS1 Mar 202529 Jul 2021publishedTarget for a physical vapor deposition chamber

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