FIG. 1 is a top plan view of a nonwoven fabric having shirred pattern according to my design shown within the environment of an absorbent pad in an extended state;

FIG. 2 is an overhead perspective view of the nonwoven fabric having shirred pattern of FIG. 1 ;

FIG. 3 is a side elevational view of the nonwoven fabric having shirred pattern of FIG. 1 ;

FIG. 4 is a right end elevational view of the nonwoven fabric having shirred pattern of FIG. 1 ; and,

FIG. 5 is a left end elevational view, thereof.

The broken lines in the figures illustrating an absorbent pad depict environmental subject matter that forms no part of the claimed design. The features in broken lines between the environment and the center rows in solid line of the article depict portions of the nonwoven fabric having shirred pattern that form no part of the claimed design.

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Claims

1 · 1 independent · depth 1

1 granted claims

›1.independentThe ornamental design for a nonwoven fabric having shirred pattern, as shown and described.

Classifications

1 codes

USPC · US Patent Classification

D05/60

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Pendency

3.2 y

1,168 days filing → grant

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after a restriction

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Examiner

Karen S Acker

art unit 2918 · TC 2900

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