USPatentGranted
S1

Mask for light exposure

Granted 12 Aug 2014 · 2 office actions

Current assignee: BBMASK CO., LTD · originally Lou T.S Co., Ltd.

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Inventors: Sang Hyuck Park · Examiner: Eric Goodman · AU 2914 · TC 2900

Application
29/446,491
filed 25 Feb 2013
Publication
Not published
not published
Patent· this page
US D711008
granted 12 Aug 2014

Life of the patent

2 dated events
⤢ drag to zoomJan 2013Apr 2013Jul 2013Oct 2013Jan 2014Apr 2014Jul 2014Oct 2014Prosecution
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Description

1 parts
›FIG. 1 is a perspective view of a…

FIG. 1 is a perspective view of a mask for light exposure according to the present design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is an illustrative view of the mask in use showing the mask worn on the face of human.

The broken lines are included for the purpose of illustrating environmental structure and form no part of the claimed design.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

1 codes
USPC · US Patent Classification
D24/209

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File wrapper

Pendency
1.5 y
533 days filing → grant
Office actions
1
non-final + final
Responses
1
no RCE
Examiner
Eric Goodman
art unit 2914 · TC 2900
Citations: 22 back · 0 forward

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Chain of title

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Citations

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