USPatentGranted
S1

Cover for a heater stage of a plasma processing apparatus

Granted 23 Dec 2008 · 2 office actions

Assignee: Tokyo Electron Limited

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Attorney: Attorney · Log in to unlock

Inventors: Atsushi Ueda · Examiner: Sandra Snapp · AU 2915 · TC 2900

Application
29/281,073
filed 14 Jun 2007
Publication
Not published
not published
Patent· this page
US D583395
granted 23 Dec 2008

Life of the patent

7 dated events
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Description

1 parts
›FIG. 1 is a front view of a…

FIG. 1 is a front view of a cover for a heater stage of a plasma processing apparatus showing my new design:

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a sectional view taken along line 5 — 5 of FIG. 1 thereof;

FIG. 6 is an enlarged view taken along line 6 — 6 of FIG. 5 thereof;

FIG. 7 is an enlarged view taken along line 7 — 7 of FIG. 5 thereof; and,

FIG. 8 is a perspective view thereof.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1
1 granted claims

Classifications

2 codes
USPC · US Patent Classification
D15/138D15/199

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File wrapper

⤢ drag to zoomJul 2007Oct 2007Jan 2008Apr 2008Jul 2008Oct 2008Jan 2009USPTOApplicantNon-final rejectionResponse after non-finalNotice of allowance
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Pendency
1.5 y
558 days filing → grant
Office actions
1
non-final + final
Responses
1
no RCE
Examiner
Sandra Snapp
art unit 2915 · TC 2900
Citations: 22 back · 0 forward

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Chain of title

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Term & fees

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Worldwide family

2 members · 2 offices
US1TW1
this patentIP5 & PCTother officessolid = grantedhover for detail · click to open
Members
2
DOCDB simple family 40134571
Offices
2
US
Granted
1 of 2
grant date present
›IP5 & PCT — 1 members
OfficePublicationKindPublishedFiledStatusTitle
USthis patentUS-D583395-SS123 Dec 200814 Jun 2007grantedCover for a heater stage of a plasma processing apparatus
›Other offices — 1 members
OfficePublicationKindPublishedFiledStatusTitle
TWTW-D130499-S1S121 Aug 200914 Jun 2007publishedA cover for a heater stage of a plasma processing apparatus

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Citations

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