FIG. 1 is a front, top and right side elevational perspective view of a processing machine for electron beam lithography system showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left elevational view thereof;

FIG. 4 is a right elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a rear, top and left side perspective view thereof.

the grant prints no section headings; every part label below is ours, taken from that part's own first words

Claims

1 · 1 independent · depth 1

1 granted claims

›1.independentThe ornamental design for a processing machine for electron beam lithography system, as shown.

Classifications

2 codes

USPC · US Patent Classification

D10/75D10/46

Claim changes

Soon

Coming soonHow the claims changed between publication and grant

See which claims were amended, added or cancelled during examination, with every added and removed word marked.

AmendedAddedCancelledUnchanged

The published claims of this patent are not paired with the granted ones in what we hold.

File wrapper

Pendency

1.8 y

659 days filing → grant

Office actions

on the grant's record

Examiner

Alan P. Douglas

art unit 293 · TC 2900

Law firm

Law firm · Log in to unlock

Citations: 0 back · 0 forward

Chain of title

⤢ drag to zoom

Titlehover for detail · click to open

See the full assignment history — every owner this patent has passed through, with recordation dates and reel/frame numbers.

Term & fees

See the term timeline — pendency span, in-force span, the maintenance fees paid and both computed expiry dates.

Validity challenges

See the validity challenges on record — reexaminations, IPRs and PGRs, with their institution decisions and outcomes.

Citations

See every patent this one cites and every patent that cites it back — publication, assignee, and how each one was found.