Pattern-forming method, and radiation-sensitive composition

A pattern-forming method comprising:nproviding a resist film on a substrate using a radiation-sensitive composition;exposing the resist film; anddeveloping the exposed resist film using a developer solution which comprises no less than 80% by mass of an organic solvent,wherein the radiation-sensitive composition comprises:na first polymer that comprises a structural unit comprising an acid-labile group;a radiation-sensitive acid generator; anda non-polymeric compound other than the radiation-sensitive acid generator,the non-polymeric compound being represented by formula (2):nR1-A−X+  (2)nwherein, in the formula (2),nR1 represents a hydrogen atom or a monovalent organic group;A− represents —N−—SO2—RD, —COO−, —O− or —SO3−, wherein in a case where A− represents —SO3−, —SO3− does not directly bond to a carbon atom which bonds to a fluorine atom;RD represents a linear or branched monovalent hydrocarbon group having 1 to 10 carbon atoms or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms, wherein a part or all of hydrogen atoms of the hydrocarbon group represented by RD may be substituted by a fluorine atom; andX+ represents an onium cation,wherein the non-polymeric compound generates an acid upon exposure, and the acid is weaker than an acid generated by the radiation-sensetive acid generator.

A radiation-sensitive composition comprising:na first polymer that comprises a structural unit comprising acid-labile group;a radiation-sensitive acid generator; anda non-polymeric compound other than the radiation-sensitive acid generator, the non-polymeric compound being represented by formula (2),nR1 -A−X+  (2)nwherein, in the formula (2),nR1 represents a hydrogen atom or a monovalent organic group;A− represents —N−—SO2—RD, —COO−, —O− or —SO3−, wherein in a case where A− represents —SO3−, —SO3− does not directly bond to a carbon atom which bond to a fluorine atom;RD represents a linear or branched monovalent hydrocarbon group having 1 to 10 carbon atoms or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms, wherein a part or all of hydrogen atoms of the hydrocarbon group represented by RD may be substituted by a fluorine atom; andX+ represents an onium cation,wherein the non-polymeric compound generates an acid upon exposure, and the acid is weaker than an acid generated by the radiation-sensitive acid generator.