A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R 1 represents a hydrogen atom or an electron-donating group, at least one R 1 is an electron-donating group, R 2 represents a monovalent organic group, and n represents 0 or 1. The third structural unit is derived from a compound shown by a formula (2), wherein R 3 represents an alkyl group having 1 to 8 carbon atoms, and R 4 represents a monovalent organic group.

Claims

15 · 1 independent · depth 3

15 granted claims

›1.independentA silicon-containing film-forming composition comprising:na polysiloxane comprising:na first structural unit derived from a tetraalkoxysilane;a second…+14

›2.↳ 1The silicon-containing film-forming composition according to claim 1, wherein the electron-donating group in the formula (1a) comprises at least one o…d2+2

›5.↳ 1The silicon-containing film-forming composition according to claim 1, wherein the second structural unit is derived from a compound shown by formula (…d2+1

›7.↳ 1The silicon-containing film-forming composition according to claim 1, wherein the polystyrene-reduced weight average molecular weight of the polysilox…d2

›8.↳ 1The silicon-containing film-forming composition according to claim 1, wherein the organic solvent comprises at least one of ether solvents and ester s…d2

›9.↳ 1The silicon-containing film-forming composition according to claim 1, wherein the silicon-containing film-forming composition comprises a structure to…d2

›10.↳ 1A pattern forming method comprising:napplying the silicon-containing film-forming composition according to claim 1 to a substrate to form a silicon-co…d2

›11.↳ 1A method of producing a silicon-containing film comprising:ncoating the silicon-containing film-forming composition according to claim 1 on a surface …d2

›12.↳ 1The silicon-containing film-forming composition according to claim 1, wherein the polysiloxane further comprises a fourth structural unit derived from…d2+1

›14.↳ 1The silicon-containing film-forming composition according to claim 1, wherein an amount of the second structural unit in the polysiloxane is from 5 to…d2

›15.↳ 1The silicon-containing film-forming composition according to claim 1, wherein an amount of the third structural unit in the polysiloxane is from 20 to…d2

Classifications

6 codes

IPC · International Patent Classification

Section C — Chemistry; metallurgy

C08G77/04
C08G77/00

Section G — Physics

G03F7/09
G03F7/30
G03F7/075
G03F7/36

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Sin Lee

art unit 1722 · TC 1700

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Type	Document	Date
related publication	US 20100233632 A1	16 Sep 2010

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