USPatentGranted
B2

Apparatus for processing substrate

Granted 25 Nov 2014 · 10 office actions

Current assignee: Samsung Display · originally Samsung Electronics

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Inventors: Kil-Won Lee, Jong-Won Hong, Eu-Gene Kang, Ki-Yong Lee +14 · Examiner: Benjamin Kendall

Life of the patent

24 dated events
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Abstract

A substrate processing apparatus that simultaneously forms thin films on a plurality of substrates and performs heat treatment includes: a plurality of substrate holders, each including a substrate support that supports a substrate and a first gas pipe having one or a plurality of injection holes; a boat where the plurality of substrate holders are stacked and including a second gas pipe connected with the first gas pipe of each of the substrate holders; a process chamber providing a space in which the substrates stacked in the boat are processed; a conveying unit that carries the boat into/out of the process chamber; a first heating unit disposed outside the process chamber; and a gas supply unit including a third gas pipe connected with the second gas pipe and supplying a heated or cooled gas into the second gas pipe.

Claims

12 · 1 independent · depth 3
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12 granted claims

Classifications

16 codes
IPC · International Patent Classification
Section C — Chemistry; metallurgy
  • C23C16/00
  • C23F1/00
  • C23C16/455
  • C23C16/46
  • C23C16/458
Section H — Electricity
  • H01L21/306
  • H01L21/673
USPC · US Patent Classification
118/724118/728156/345.32156/345.51156/345.34156/345.33156/345.3156/345.29118/715

Claim changes

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File wrapper

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Pendency
3.9 y
1,419 days filing → grant
Office actions
5
after a restriction
Responses
4
3 RCE
Interviews
4
examiner interview summaries
Examiner
Benjamin Kendall
art unit —
Citations: 15 back · 0 forward

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Term & fees

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20120000425 A15 Jan 2012

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Citations

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