A metal pattern composition comprising:na conductive metal or a conductive metal precursor compound; anda carboxylic acid-amine base ion pair salt,wherein the carboxylic acid-amine base ion pair salt is represented by the following Chemical Formula 2:
›2.↳ 1The metal pattern composition of claim 1, wherein the conductive metal comprises a Group 3 to Group 12 element, a main group metal, or a combination t…d2+2
The metal pattern composition of claim 1, wherein the conductive metal comprises a Group 3 to Group 12 element, a main group metal, or a combination thereof.
›3.↳ 2The metal pattern composition of claim 2, wherein the main group metal is a metal of Group 13 to Group 16.d3
The metal pattern composition of claim 2, wherein the main group metal is a metal of Group 13 to Group 16.
›23.↳ 2The metal pattern composition of claim 2, wherein a metal of the conductive metal or the conductive metal precursor compound comprises copper.d3
The metal pattern composition of claim 2, wherein a metal of the conductive metal or the conductive metal precursor compound comprises copper.
›4.↳ 1The metal pattern composition of claim 1, wherein the conductive metal precursor compound is represented by the following Chemical Formula 1:nMlLnXm⬒⬒…d2+2
The metal pattern composition of claim 1, wherein the conductive metal precursor compound is represented by the following Chemical Formula 1:nMlLnXm⬒⬒Chemical Formula 1
›24.↳ 4The metal pattern composition of claim 4, wherein M comprises copper.d3+1
The metal pattern composition of claim 4, wherein M comprises copper.
›25.↳ 24The metal pattern composition of claim 24, wherein the conductive metal precursor compound is copper hydroxide.d4
The metal pattern composition of claim 24, wherein the conductive metal precursor compound is copper hydroxide.
›5.↳ 1The metal pattern composition of claim 1, wherein the conductive metal or the conductive metal precursor compound has an average largest particle diam…d2
The metal pattern composition of claim 1, wherein the conductive metal or the conductive metal precursor compound has an average largest particle diameter of about 1 to about 5000 nanometers.
›6.↳ 1The metal pattern composition of claim 1, wherein R1 is represented by the following Chemical Formula 2-1:d2
The metal pattern composition of claim 1, wherein R1 is represented by the following Chemical Formula 2-1:
›7.↳ 1The metal pattern composition of claim 1, wherein at least one of R2 to R4 is represented by the following Chemical Formula 3-1:d2
The metal pattern composition of claim 1, wherein at least one of R2 to R4 is represented by the following Chemical Formula 3-1:
›8.↳ 1The metal pattern composition of claim 1, wherein the metal pattern composition further comprises about 1 to about 99 weight percent of a metal ion de…d2
The metal pattern composition of claim 1, wherein the metal pattern composition further comprises about 1 to about 99 weight percent of a metal ion derived from the conductive metal or the conductive metal precursor compound, based on the total weight of the metal pattern composition.
›9.↳ 1The metal pattern composition of claim 1, wherein the metal pattern composition comprises about 5 to about 70 weight percent of a metal ion derived fr…d2
The metal pattern composition of claim 1, wherein the metal pattern composition comprises about 5 to about 70 weight percent of a metal ion derived from the conductive metal or the conductive metal precursor compound, based on the total weight of the metal pattern composition.
›10.↳ 1The metal pattern composition of claim 1, wherein the carboxylic acid-amine base ion pair salt is included in an amount of about 1 weight percent to a…d2
The metal pattern composition of claim 1, wherein the carboxylic acid-amine base ion pair salt is included in an amount of about 1 weight percent to about 99 weight percent, based on the total weight of the metal pattern composition.
›11.↳ 1The metal pattern composition of claim 1, wherein the carboxylic acid-amine base ion pair salt has a boiling point of about 80 to about 300° C., where…d2
The metal pattern composition of claim 1, wherein the carboxylic acid-amine base ion pair salt has a boiling point of about 80 to about 300° C., wherein the boiling point is measured using differential thermal analysis of a curved line of thermogravimetric analysis.
›12.↳ 1The metal pattern composition of claim 1, wherein the metal pattern composition has a viscosity of about 1 to about 100,000 centipoise.d2
The metal pattern composition of claim 1, wherein the metal pattern composition has a viscosity of about 1 to about 100,000 centipoise.
›13.↳ 1The metal pattern composition of claim 1, wherein the metal pattern composition further comprises a conductive metal nanoparticle.d2
The metal pattern composition of claim 1, wherein the metal pattern composition further comprises a conductive metal nanoparticle.
›14.↳ 1The metal pattern composition of claim 1, wherein the metal pattern composition further comprises an additive, wherein the additive is an adhesive, a …d2
The metal pattern composition of claim 1, wherein the metal pattern composition further comprises an additive, wherein the additive is an adhesive, a dispersing agent, a binder resin, a reducing agent, a surfactant, a humectant, a viscoelasticity controlling agent, a leveling agent, or a combination thereof.
›26.↳ 1The metal pattern composition of claim 1, wherein x in Chemical Formula 2 is 0.d2+3
The metal pattern composition of claim 1, wherein x in Chemical Formula 2 is 0.
›27.↳ 26The metal pattern composition of claim 26, wherein R3 to R5 are hydrogen.d3+2
The metal pattern composition of claim 26, wherein R3 to R5 are hydrogen.
›28.↳ 27The metal pattern composition of claim 27,nwherein the carboxylic acid-amine base ion pair salt of Chemical Formula 2 is a formic acid salt, andwherei…d4+1
The metal pattern composition of claim 27,nwherein the carboxylic acid-amine base ion pair salt of Chemical Formula 2 is a formic acid salt, andwherein a metal of the conductive metal or the conductive metal precursor compound comprises copper.
›29.↳ 28The metal pattern composition of claim 28, wherein the conductive metal or the conductive metal precursor compound is copper hydroxide.d5
The metal pattern composition of claim 28, wherein the conductive metal or the conductive metal precursor compound is copper hydroxide.