USPatentGranted
B2

Formation method of coating

Granted 18 Mar 2014 · 2 office actions

Assignee: CNK Co., Ltd.

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Attorney: Attorney · Log in to unlock

Inventors: Hiroyuki Hashitomi, Kazuyoshi Yamakawa, Tomoki Ogawa, Daigo Yamamoto +4 · Examiner: Kelly M Gambetta · AU 1715 · TC 1700

Life of the patent

9 dated events
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Abstract

A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attaching a shield member that shields an uncoated member to an uncoated part where the coating of the coated body is not formed with separation spacing over a coated part where the coating is to be formed for preventing decrease of hardness of the coating in the coated part.

Claims

11 · 1 independent · depth 4
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11 granted claims

Classifications

4 codes
IPC · International Patent Classification
Section C — Chemistry; metallurgy
  • C23C16/32
Section H — Electricity
  • H05H1/24
USPC · US Patent Classification
427/569427/8

Claim changes

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File wrapper

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Pendency
2.6 y
956 days filing → grant
Office actions
1
non-final + final
Responses
2
1 RCE
Examiner
Kelly M Gambetta
art unit 1715 · TC 1700
Citations: 8 back · 0 forward

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Term & fees

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20120034393 A19 Feb 2012

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Citations

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