The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.

Claims

8 · 2 independent · depth 2

8 granted claims

›1.independentA plasma generator comprising:na) a vacuum chamber;b) a stage located within the vacuum chamber on which a base plate is to be placed; andc) multiple …+6

›8.independentA plasma control method comprising:nproviding a plasma generator having multiple U-shaped RF antennas located within a vacuum chamber, said antennas b…

Classifications

9 codes

IPC · International Patent Classification

Section C — Chemistry; metallurgy

C23C15/00
C23C16/00

Section H — Electricity

H01L21/306
H05H1/24

USPC · US Patent Classification

156/345.48216/68427/569118/723.I118/723.AN

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Pendency

2.8 y

1,007 days filing → grant

Office actions

non-final + final

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Luz L. Alejandro

art unit 1716 · TC 1700

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›Priority documents — 1

Type	Document	Date
related publication	US 20100304046 A1	2 Dec 2010

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