Inverse mask design and correction for electronic design

A computer system comprising:none or more processors; anda memory having computer executable instructions stored thereon that cause the one or more processors to perform a set of operations, the set of operations comprising:reading all or a portion of a desired layout pattern;defining a set of mask data having a number of pixels that are assigned a transmission value;determining an objective function that compares a simulation of the image intensity on a wafer to an ideal image intensity;defining a set of ideal image intensities from the desired layout pattern, wherein the maximum ideal image intensity is selected to be substantially equal to the maximum image intensity determined from a test image of features at the tightest pitch pattern produced by the photolithographic imaging system;minimizing the objective function to determine a first set of transmission values for the pixels in the mask data that will produce the desired layout on a wafer;deriving a geometric representation from the set of mask data and the first set of transmission values;applying a geometric simplification process to the geometric representation to generate a simplified geometric representation;determining a second set of transmission values for the pixels in the mask data from the simplified geometric representation.

A method comprising:nreading all or a portion of a desired layout pattern;defining a set of mask data having a number of pixels that are assigned a transmission value;determining an objective function that compares a simulation of the image intensity on a wafer to an ideal image intensity;defining a set of ideal image intensities from the desired layout pattern, wherein the maximum ideal image intensity is selected to be substantially equal to the maximum image intensity determined from a test image of features at the tightest pitch pattern produced by the photolithographic imaging system;minimizing the objective function to determine a first set of transmission values for the pixels in the mask data that will produce the desired layout on a wafer;deriving a geometric representation from the set of mask data and the first set of transmission values;applying a geometric simplification process to the geometric representation to generate a simplified geometric representation;determining a second set of transmission values for the pixels in the mask data from the simplified geometric representation; andsaving the set of mask data and the second set of transmission values to a memory storage location.

One or more non-transitory computer-readable media comprising a set of computer-executable instructions that cause a computer to perform a set of operations, the set of operations including:nreading all or a portion of a desired layout pattern;defining a set of mask data having a number of pixels that are assigned a transmission value;determining an objective function that compares a simulation of the image intensity on a wafer to an ideal image intensity;defining a set of ideal image intensities from the desired layout pattern, wherein the maximum ideal image intensity is selected to be substantially equal to the maximum image intensity determined from a test image of features at the tightest pitch pattern produced by the photolithographic imaging system;minimizing the objective function to determine a first set of transmission values for the pixels in the mask data that will produce the desired layout on a wafer;deriving a geometric representation from the set of mask data and the first set of transmission values;applying a geometric simplification process to the geometric representation to generate a simplified geometric representation, wherein the geometric simplification process includes applying an orthogonal geometric simplification algorithm to the geometric representation;applying a mask rule constraint clean-up process to the simplified geometric representation to generate an MRC clean geometric representation; anddetermining a second set of transmission values for the pixels in the mask data from the MRC clean geometric representation.