USPatentGranted
B2

Flow rate measuring device, and gas supply system employing it, method for specifying gas appliance

Granted 8 Nov 2011 · 2 office actions

Assignee: Panasonic

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Inventors: Yasuhiro Umekage, Kenichi Kamon, Hajime Miyata · Examiner: Sujoy Kundu · AU 2857 · TC 2800

Life of the patent

9 dated events
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Abstract

A flow rate measuring device has a flow rate measurement unit, an appliance registering unit, a calculating unit, a determining unit, a first appliance identifying unit, and a second appliance identifying unit. The appliance registering unit stores at least first gas flow rate variation profiles on activation of respective gas appliances coupled to a flow channel, and second gas flow rate variation profiles based on the control specific to the respective gas appliances. The first appliance identifying unit identifies which gas appliance is activated based on the first gas flow rate variation profiles on activation. When a determining unit detects a stop of any of gas appliances, the second appliance identifying unit identifies a gas appliance in continuous use by using the second gas flow rate variation profiles based on the control specific to the respective gas appliances.

Claims

24 · 6 independent · depth 4
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24 granted claims

Classifications

13 codes
IPC · International Patent Classification
Section G — Physics
  • G01F1/00
USPC · US Patent Classification
702/45702/50702/181702/106702/18073/861700/282702/189702/100702/179702/52702/12

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File wrapper

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Pendency
2.4 y
888 days filing → grant
Office actions
1
non-final + final
Responses
1
1 RCE
Examiner
Sujoy Kundu
art unit 2857 · TC 2800
Citations: 7 back · 0 forward

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Term & fees

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20090240445 A124 Sep 2009

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Citations

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