High-repetition mode-coupled ultra-short pulse laser system for generating pulses, according to the principle of cavity dumping, comprising:nan amplifying laser medium;a laser resonator with at least one resonator mirror and at least one cavity dumping component;a saturable absorber mirror; anda pump source for pumping the laser medium;wherein the cavity dumping component is an electro-optical modulator and the laser system is configured to generate femtosecond or picosecond pulses with a repetition rate of greater than 10 kHz and a peak pulse power greater than 100 kW.
›2.↳ 1The ultra-short pulse laser system according to claim 1, wherein the electro-optical modulator is a BBO cell.d2
The ultra-short pulse laser system according to claim 1, wherein the electro-optical modulator is a BBO cell.
›3.↳ 1The ultra-short pulse laser system according to claim 1, wherein the electro-optical modulator is an RTP cell.d2+1
The ultra-short pulse laser system according to claim 1, wherein the electro-optical modulator is an RTP cell.
›12.↳ 3The ultra-short pulse laser system according to claim 3, wherein the RTP cell comprises a component for compensating a thermal drift.d3
The ultra-short pulse laser system according to claim 3, wherein the RTP cell comprises a component for compensating a thermal drift.
›4.↳ 1The ultra-short pulse laser system according to claim 1, further comprising at least one dispersive mirror for dispersion compensation.d2+3
The ultra-short pulse laser system according to claim 1, further comprising at least one dispersive mirror for dispersion compensation.
›5.↳ 4The ultra-short pulse laser system according to claim 4, wherein the laser system is formed so that, in the generation of picosecond pulses, the nonli…d3+1
The ultra-short pulse laser system according to claim 4, wherein the laser system is formed so that, in the generation of picosecond pulses, the nonlinear phase is less than 100 mrad, the nonlinear phase being calculated per resonator cycle and per 1% modulation depth of the saturable absorber mirror.
›14.↳ 5The ultra-short pulse laser system according to claim 5, wherein the nonlinear phase is less than 10 mrad.d4
The ultra-short pulse laser system according to claim 5, wherein the nonlinear phase is less than 10 mrad.
›13.↳ 4The ultra-short pulse laser system according to claim 4, wherein the at least one dispersive mirror for dispersion compensation is a Gires-Tournois in…d3
The ultra-short pulse laser system according to claim 4, wherein the at least one dispersive mirror for dispersion compensation is a Gires-Tournois interferometer.
›6.↳ 1The ultra-short pulse laser system according to claim 1, wherein the laser system is formed so that, in the generation of femtosecond pulses, the r pa…d2+1
The ultra-short pulse laser system according to claim 1, wherein the laser system is formed so that, in the generation of femtosecond pulses, the r parameter is less than 1.
›15.↳ 6The ultra-short pulse laser system according to claim 6, wherein the r parameter is less than 0.25.d3
The ultra-short pulse laser system according to claim 6, wherein the r parameter is less than 0.25.
›7.↳ 1The ultra-short pulse laser system according to claim 1 wherein the laser medium is ytterbium-doped glass or Nd:YVO4.d2
The ultra-short pulse laser system according to claim 1 wherein the laser medium is ytterbium-doped glass or Nd:YVO4.
›8.↳ 1The ultra-short pulse laser system according to claim 1, wherein the laser medium comprises ytterbium-doped tungstates.d2+1
The ultra-short pulse laser system according to claim 1, wherein the laser medium comprises ytterbium-doped tungstates.
›16.↳ 8The ultra-short pulse laser system according to claim 8, wherein the laser medium comprises Yb:KGW or Yb:KYW.d3
The ultra-short pulse laser system according to claim 8, wherein the laser medium comprises Yb:KGW or Yb:KYW.
›9.↳ 1The ultra-short pulse laser system according to claim 1, wherein the laser medium has a disc-like geometry.d2
The ultra-short pulse laser system according to claim 1, wherein the laser medium has a disc-like geometry.
›10.↳ 1The ultra-short pulse laser system according to claim 1, wherein the pump source is formed and is arranged in such a way that a pump light spot having…d2+1
The ultra-short pulse laser system according to claim 1, wherein the pump source is formed and is arranged in such a way that a pump light spot having a ratio of length to width of at least 2:1 is formed, the pump light spot consisting of a single ray or the combination of a plurality of rays.
›17.↳ 10The ultra-short pulse laser system according to claim 10, wherein the pump light spot consists of the combination of a plurality of rays, the rays bei…d3
The ultra-short pulse laser system according to claim 10, wherein the pump light spot consists of the combination of a plurality of rays, the rays being generated by laser diodes.
›11.↳ 1The ultra-short pulse laser system according to claim 1, wherein the pump source is a laser diode source.d2
The ultra-short pulse laser system according to claim 1, wherein the pump source is a laser diode source.
›18.↳ 1A method of processing a material, comprising:nproviding a material to be processed by plasma generation, andprocessing the material using the high-re…d2
A method of processing a material, comprising:nproviding a material to be processed by plasma generation, andprocessing the material using the high-repetition mode-coupled ultra-short pulse laser system according to claim 1.
›19.↳ 1The ultra-short pulse laser system according to claim 1, wherein the repetition rate is greater than 100 kHz.d2
The ultra-short pulse laser system according to claim 1, wherein the repetition rate is greater than 100 kHz.
›20.↳ 1The ultra-short pulse laser system according to claim 1, wherein the laser system is configured to generate the pulses with a pulse energy above 100 n…d2
The ultra-short pulse laser system according to claim 1, wherein the laser system is configured to generate the pulses with a pulse energy above 100 nJ.
›21.↳ 1The ultra-short pulse laser system according to claim 1, wherein the laser system is configured to generate the pulses with a peak pulse power greater…d2
The ultra-short pulse laser system according to claim 1, wherein the laser system is configured to generate the pulses with a peak pulse power greater than 1 MW.
›22.↳ 1The ultra-short pulse laser system according to claim 1, wherein the laser system is configured to generate the pulses with a pulse energy above 400 n…d2
The ultra-short pulse laser system according to claim 1, wherein the laser system is configured to generate the pulses with a pulse energy above 400 nJ.
