USPatentGranted
B2

Method for forming micro lenses

Granted 8 Dec 2009 · 6 office actions

Assignee: Tokyo Electron Limited

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Inventors: Hiroki Amemiya · Examiner: Allan Olsen · AU 1792 · TC 1700

Life of the patent

14 dated events
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Abstract

A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF 6 gas and CHF 3 gas, an etching gas including SF 6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

Claims

7 · 1 independent · depth 3
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7 granted claims

Classifications

4 codes
IPC · International Patent Classification
Section G — Physics
  • G02B3/00
Section H — Electricity
  • H01L27/14
USPC · US Patent Classification
216/26430/321

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File wrapper

⤢ drag to zoomJul 2004Jan 2005Jul 2005Jan 2006Jul 2006Jan 2007Jul 2007Jan 2008Jul 2008Jan 2009Jul 2009Jan 2010USPTOApplicantRestriction requirementResponse after non-finalNon-final rejectionNon-final rejectionRequest for continued examination
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Pendency
5.2 y
1,905 days filing → grant
Office actions
3
after a restriction
Responses
3
1 RCE
Examiner
Allan Olsen
art unit 1792 · TC 1700
Citations: 21 back · 0 forward

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Term & fees

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Priority chain

1 priority documents
›Priority documents — 1
TypeDocumentDate
related publicationUS 20050061772 A124 Mar 2005

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Citations

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