A display substrate includes an insulating substrate, a thin film transistor, a contact electrode, and a pixel electrode. The thin film transistor includes a control electrode, a semiconductor pattern, a first electrode, and a second electrode. The control electrode is on the insulating substrate. The semiconductor pattern is on the control electrode. The first electrode is on the semiconductor pattern. The second electrode is spaced apart from the first electrode on the semiconductor pattern. The contact electrode includes a contact portion and an undercut portion. The contact portion is electrically connected to the second electrode to partially expose the semiconductor pattern. The undercut portion is electrically connected to the contact portion to cover the semiconductor pattern. The pixel electrode is electrically connected to the second electrode through the contact portion of the contact electrode.

Claims

17 · 2 independent · depth 6

17 granted claims

›1.independentA method of manufacturing a display substrate, comprising:nforming a semiconductor pattern, a signal electrode on the semiconductor pattern, and a con…+14

›2.↳ 1The method of claim 1, further comprising:nforming a photoresist film on the passivation layer; andpatterning the photoresist film using a mask.d2+10

›3.↳ 2The method of claim 2, wherein the mask comprises:nan opaque portion covering the signal electrode;a transparent portion corresponding to a portion of…d3+5

›4.↳ 3The method of claim 3, wherein an interface between the first translucent portion and the second translucent portion has a substantially linear shape,…d4

›5.↳ 3The method of claim 3, wherein an interface between the first translucent portion and the second translucent portion has a substantially linear shape,…d4

›6.↳ 3The method of claim 3, wherein an interface between the first translucent portion and the second translucent portion has a substantially linear shape …d4

›7.↳ 3The method of claim 3, wherein an upper edge of the contact electrode has a substantially linear shape, and an interface between the first translucent…d4

›8.↳ 3The method of claim 3, wherein an upper edge of the contact electrode has a substantially linear shape, an interface between the first translucent por…d4

›9.↳ 2The method of claim 2, wherein the first etching comprises using the patterned photoresist film as a mask.d3+3

›13.↳ 1The method of claim 1, wherein forming the pixel electrode comprises depositing a transparent conductive layer on the insulating substrate in a first …d2

›14.↳ 1The method of claim 1, wherein forming the pixel electrode comprises forming a transparent conductive layer directly on the contact portion of the con…d2+1

›16.independentA method of manufacturing a display substrate, comprising:nforming a semiconductor pattern, a signal electrode on the semiconductor pattern, and a con…+1

Classifications

5 codes

IPC · International Patent Classification

Section H — Electricity

H01L21/00
H01L21/84

USPC · US Patent Classification

438/149257/72257/59

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Anthony Ho

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›Priority documents — 1

Type	Document	Date
related publication	US 20080017864 A1	24 Jan 2008

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