Method of manufacturing electron-beam source and image forming apparatus using same, and activation processing method

An electron-beam source manufacturing method comprising an activation step of generating activation material at a plurality of electron-emitting devices, by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group, with the voltage applied to each group having a plurality of voltage pulses, and wherein during an interval of pulses applied to one group, pulse application is made to other groups.

An electron-beam source manufacturing method comprising an activation step of generating activation material at a plurality of electron-emitting devices, by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group, wherein said activation step includes a first activation step of generating activation material at the plurality of electron-emitting devices by dividing the electron-emitting devices into a plurality of first groups and sequentially applying voltage to each first group, and a second activation step of generating activation material at the plurality of electron-emitting devices by dividing the electron-emitting devices into a plurality of second groups and sequentially applying voltage to each second group.

A method for manufacturing an image forming apparatus which comprises an image forming unit for forming an image by irradiation of electron beams from an electron-beam source having a plurality of electron-emitting devices, wherein said electron-beam is manufactured by using an activation step of generating activation material at a plurality of electron-emitting devices, by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group, wherein the voltage applied to each group has a plurality of voltage pulses, and wherein during an interval of pulses applied to one group, pulse application is made to other groups.

An electron-beam source activation method for activating an electron-beam source having a plurality of electron-emitting devices comprising an activation step of generating activation material at a plurality of electron-emitting devices, by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group, wherein the voltage applied to each group has a plurality of voltage pulses, and wherein during an interval of pulses applied to one group, pulse application is made to other groups.

An electron-beam source activation method for activating an electron-beam source having a plurality of electron-emitting devices comprising an activation step of generating activation material at a plurality of electron-emitting devices, by dividing the plurality of electron-emitting devices into plural groups and sequentially applying voltage to each group, wherein said activation step includes a first activation step of dividing the plurality of electron-emitting devices into a plurality of first groups and sequentially applying voltage to each first group, and a second activation step of dividing the plurality of electron-emitting devices into a plurality of second groups and sequentially applying voltage to each second group.

A method of manufacturing an electron-beam source having a plurality of electron-emitting devices, comprising the steps of: a first step of generating a carbon or carbon compound material at an electron-emitting device at a predetermined time interval; and a second step of generating, during the interval of the first step of generating carbon or carbon compound material at the electron-emitting device, a carbon or carbon compound material at another electron-emitting device.

A method of manufacturing an electron-beam source having a plurality of electron-emitting devices, comprising: a first step of applying a voltage to an electron-emitting device at a predetermined time interval so that an activation material is generated at the electron-emitting device; and a second step of applying a voltage to another electron-emitting device so that an activation material is generated at the another electron-emitting device during the interval of the voltage applying of said first step.