A semiconductor package comprising: a semiconductor chip having a semiconductor substrate, a plurality of pads formed above said semiconductor substrate, and a first passivating film formed over an entire surface of said semiconductor substrate and having openings above said pads, and the surface of said first passivating film being flat; a plurality of interconnection lines formed on the surface of said first passivating film, each of said interconnection lines being connected to a respective one of said pads; a second passivating film formed over the entire surface of said first passivating film and having through holes each located only above a respective one of said interconnection lines, said through holes being arranged in the form of an array and the surface of said second passivating film being flat; a metal layer formed on the bottom and sides of each of said through holes; and a plated layer formed within and above each of said through holes, said plated layer forming each of contacts for connection to external leads above a respective one of said through holes, wherein said external leads are directly connected to a printed-circuit board.
›50.↳ 49The semiconductor package according to claim 49, wherein said plurality of pads is placed along the edges of said semiconductor substrate.d2
The semiconductor package according to claim 49, wherein said plurality of pads is placed along the edges of said semiconductor substrate.
›51.↳ 49The semiconductor package according to claim 49, wherein said plurality of pads is placed evenly over the entire surface of said semiconductor substra…d2
The semiconductor package according to claim 49, wherein said plurality of pads is placed evenly over the entire surface of said semiconductor substrate.
›52.↳ 49The semiconductor package according to claim 49, wherein the edges of said semiconductor substrate are inside the edges of said second passivating fil…d2
The semiconductor package according to claim 49, wherein the edges of said semiconductor substrate are inside the edges of said second passivating film.
›53.↳ 49The semiconductor package according to claim 49, wherein each of said interconnection lines is made of one of conductors including aluminum and copper…d2
The semiconductor package according to claim 49, wherein each of said interconnection lines is made of one of conductors including aluminum and copper.
›54.↳ 49The semiconductor package according to claim 49, wherein said second passivating film functions as a package and has a thickness in the range of 0.05 …d2
The semiconductor package according to claim 49, wherein said second passivating film functions as a package and has a thickness in the range of 0.05 to 0.2 mm.
›55.↳ 49The semiconductor package according to claim 49, wherein the edges of said second passivating film are rounded off.d2
The semiconductor package according to claim 49, wherein the edges of said second passivating film are rounded off.
›56.↳ 49The semiconductor package according to claim 49, wherein each of said first and second passivating films is made of one of insulating materials includ…d2
The semiconductor package according to claim 49, wherein each of said first and second passivating films is made of one of insulating materials including silicon oxide and silicon nitride.
›57.↳ 49The semiconductor package according to claim 49, wherein, when viewed from above said semiconductor substrate, said contacts are placed symmetrically …d2
The semiconductor package according to claim 49, wherein, when viewed from above said semiconductor substrate, said contacts are placed symmetrically with respect to the central point of said second passivating film.
›58.↳ 49The semiconductor package according to claim 49, wherein said contacts are placed evenly over the entire surface of said second passivating film.d2
The semiconductor package according to claim 49, wherein said contacts are placed evenly over the entire surface of said second passivating film.
›59.↳ 49The semiconductor package according to claim 49, wherein said contacts are placed along the edges of said second passivating film.d2
The semiconductor package according to claim 49, wherein said contacts are placed along the edges of said second passivating film.
›60.↳ 49The semiconductor package according to claim 49, wherein, when viewed from above said semiconductor substrate, each of said contacts has a circular sh…d2
The semiconductor package according to claim 49, wherein, when viewed from above said semiconductor substrate, each of said contacts has a circular shape.
›61.↳ 49The semiconductor package according to claim 49, wherein, when viewed from above said semiconductor substrate, said semiconductor substrate has a squa…d2
The semiconductor package according to claim 49, wherein, when viewed from above said semiconductor substrate, said semiconductor substrate has a square shape and measures 13.5 mm on a side, each of said contacts has a circular shape with a diameter of 0.5 mm, and the pitch of said contacts is 1 mm.
›62.↳ 49The semiconductor package according to claim 49, wherein said metal layer is made of at least one of metals including titanium, nickel, and palladium.d2
The semiconductor package according to claim 49, wherein said metal layer is made of at least one of metals including titanium, nickel, and palladium.
›63.↳ 49The semiconductor package according to claim 49, wherein each of said contacts is made of one of conductors including copper, gold, nickel, and a two-…d2
The semiconductor package according to claim 49, wherein each of said contacts is made of one of conductors including copper, gold, nickel, and a two-layered structure of nickel and gold.
›64.↳ 49The semiconductor package according to claim 49, further comprising solder balls each formed on a respective one of said contacts.d2
The semiconductor package according to claim 49, further comprising solder balls each formed on a respective one of said contacts.
›65.↳ 49The semiconductor package according to claim 49, wherein a bottom surface of the semiconductor package comprises a bottom surface of the semiconductor…d2
The semiconductor package according to claim 49, wherein a bottom surface of the semiconductor package comprises a bottom surface of the semiconductor substrate.