USPatentGranted

Total reflection X-ray fluorescence apparatus

Granted 28 Apr 1992 · no office action yet

Current assignee: TECHNOS CO., LTD. · originally Sumitomo Chemical

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Inventors: Tetsuya Ohsugi, Kazuo Nishihagi, Michihisa Kyoto · Examiner: Janice A. Howell

Application
597027
filed 15 Oct 1990
Publication
Not published
not published
Patent· this page
US 5,109,396
granted 28 Apr 1992

Life of the patent

2 dated events
⤢ drag to zoomOct 1990Jan 1991Apr 1991Jul 1991Oct 1991Jan 1992Apr 1992Prosecution
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Abstract

A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.

Claims

23 · 3 independent · depth 3
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23 granted claims

Classifications

4 codes
USPC · US Patent Classification
378/46378/90378/84378/44

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Pendency
1.5 y
561 days filing → grant
Office actions
0
on the grant's record
Examiner
Janice A. Howell
art unit —
Citations: 4 back · 0 forward

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